Ultra High Vacuum Sputtering System
High Vacuum Sputtering System is a machine that deposits metal and dielectric thin films on substrates up to 300 millimetres. The system uses magnetron sputtering sources powered by radio frequency, direct current or pulsed direct current, working in single mode or in co-deposition mode. A modular structure allows simple installation, transport and maintenance. The housing is made of cold rolled steel with sheet metal forming and spray finishing, an aluminium inner frame and a translucent grey acrylic cover. The control screen follows ergonomic principles.
Continue reading